8^th International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces

Welcome to ESPS-NIS

The aim of the 8^th ESPS-NIS is to address recent developments in the area of high index surfaces, from nanopatterns to vicinal substrates, and of semiconductor nanostructures, from their formation and control to their properties and applications. High index semiconductor surfaces are interesting and technologically important since they display many intriguing properties that may be exploited to provide a variety of scientific and industrial applications. These features range from nucleation sites for nanostructure growth to novel electronic properties. The shape of high index surfaces is also a large matter of investigation.

A major topic of the workshop concerns the nucleation and growth of nanostructures on high index surfaces, template layers (from organic to semiconductor), and nanopatterns. It will provide a common forum for scientists from fields of theory, surface science, growth, nanopatterning, characterization and device fabrication. Special attention will be paid to the understanding of the formation, evolution and organization of nanoscale systems. The 8^th ESPS-NIS International Workshop will cover fundamental issues in nucleation, crystal growth, surface and interface atomistic mechanisms, electronic structure and applications. Emphasis will be placed on the optical, electrical, and magnetic properties of semiconductor nanostructures. Of relevant importance are also the novel properties induced by the atomic steps of high index surfaces on low scale nanostructure properties. New insights into short term and futuristic device applications will be of prime interest in the framework of the 8^th ESPS-NIS workshop.

Confirmed Invited Speakers

• Erik Bakkers (Philips Research Labs, Eindhoven, The Netherlands)
• Paola Atkinson (Institut für Festkörper und Wekstoffforschung, Dresden, Germany)
• Günther Springholz (Johannes Kepler University, Linz, Austria)
• Yong-Wei Zang (National University of Singapore, Singapore)
• Zhiming M. Wang (University of Arkansas, USA)
• Takaaki Mano (National Institute for Materials Science, Tsukuba, Japan)
• Kouichi Akahane (National Institute of Information and Communications Technology, Tokyo, Japan)
• Harun Solak (Eulitha and Paul Scherrer Institute, Villigen, Switzerland)
• Jae-Young Choi (Samsung Advanced Institute of Technology, Suwon, South Korea)
• Shiro Tsukamoto (Anan National College of Technology, Anan, Japan)
• Magnus T. Borgström (Lund University, Lund, Sweden)

Proceedings

Proceedings will be published in Nanoscale Research Letters.