8^th International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces

Call for abstracts

The call for abstract will open on Monday the 2^nd of November 2009 and has been extended to 5 pm GMT on Monday the 15^th of February 2010.

Notification of acceptance or rejection will be sent by Monday the 15^th of March 2010.

Proceedings

Authors of selected abstracts were invited to contribute to the proceedings, which have been published in Nanoscale Research Letters, volume 5 issue 12.

Topics

We welcome both experimental and theoretical contibutions on the following topics:

1. Advanced nanopatterning techniques.
2. Growth of semiconductors on patterned substrates:
   1. films,
   2. 3D islands,
   3. wires.
3. Semiconductor epitaxial growth on novel index surfaces.
4. Unconventional epitaxial methods for semiconductor growth.
5. Electronic, magnetic, optical and transport properties of semiconductor nanostructures on patterned or novel index substrates.
6. Micro- and opto-electronics with nanopatterned semiconductor substrates: nanodevice fabrication technology, characterization and modelling.
7. Semiconductor patterned substrates and structures for novel applications.
8. Nanoscale epitaxial growth.
9. Heterogeneous integration using selective pattern growth.

Submission

Abstracts should be sent to in Word (not .docx), OpenOffice, or L^AT_EX format, and a .pdf version should be included. Word users should compress the .doc file if possible, L^AT_EX users should make a .zip or a compressed (gzip or bzip2) tarball.

The above address is for abstract submissions only: for technical or scientific questions contact and for logistical questions contact the Centro Volta.

Templates

Templates with instructions for the formatting of your abstract are available for

• Word To create a .pdf from your Word document, install a postscript printer driver, such as the Generic Postscript Printer from Adobe, and print the document to a file using this printer making sure that “Optimize for portability” is selected in “Printing Preferences → Advanced → Document Options → Postscript Options → Postscript Output Option”. Change the extension of the file from .prn to .ps. Install Ghostscript and GSiew. Open the .ps file with GSview, then select “File → Convert... → Device: pdfwrite; Resolution: 72; Pages: 1”. If you have the full version of Adobe Acrobat installed (not just the free Reader) then you will have the ability to make a .pdf directly from Word: check that this does not change the formatting of the document.
• OpenOffice To create a .pdf from your OpenOffice document, click the “Export Directly as PDF” button on the taskbar or select “File → Export as PDF...”
• L^AT_EX To create a .pdf from your L^AT_EX document, run dvipdf.